• Plasma Sputtering Coater With 3 Sputtering Sources
  • Plasma Sputtering Coater With 3 Sputtering Sources
  • Plasma Sputtering Coater With 3 Sputtering Sources

Plasma Sputtering Coater With 3 Sputtering Sources

Brand Shenyang Kejing

Product origin Shenyang, China

Delivery time 22 working days

Supply capacity 50 sets

VTC-600-3HD Threel-Head Magnetron Sputtering Coater is a coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-3HD three-head magnetron sputtering coater is equipped with three target guns, one RF power supply for sputter coating of non-conductive materials, and two DC power supplies for sputter coating of conductive materials.

Plasma Sputtering Coater With 3 Sputtering Sources

Main Features

1. It is equipped with three target guns, one RF power supply is used for sputter coating of non-conductive materials, and two DC power supply is used for sputter coating of conductive materials (The target gun can be exchanged according to customer needs).

2. A variety of thin films can be prepared with a wide range of applications.

3. Small size and easy to operate

4. Modular design of the whole machine; separate/split-type design of vacuum chamber, vacuum pump group and control power supply, which can be adjusted according to the actual needs of users.

5. The power supply can be selected according to the actual needs of the user. One power supply can control multiple target guns, or multiple power sources can control one single target gun.



Technical Parameters

Product Name

VTC-600-3HD Threel-Head Magnetron Sputtering Coater

Product Model

VTC-600-3HD

Installation Conditions

This equipment is required to be used at an altitude of 1000m or less, a temperature of 25℃±15℃, and a humidity of 55%Rh±10%Rh.

1. Water: The equipment is equipped with a self-circulating water cooler (filling with pure water or deionized water)

2. Electricity: AC220V 50Hz, must have good grounding

3. gas: The equipment chamber needs to be filled with argon gas (purity 99.99% or more), and argon gas cylinders (with Ø6mm double ferrule joints) and pressure reducing valve need to be provided by users.

4. Workbench: size 1500mm×600mm×700mm, bearing more than 200kg

5. Ventilation device: needed

Major Parameters

(Specification)

1. Power supply voltage: 220V 50Hz

2. Power: <2.5kW

3. Limit of vacuum degree: E-6mbar (E-5mbar can be reached when used with our company’s equipment)

4. Heating temperature: RT-500℃, accuracy ±1℃ (Temperature can be increased according to actual needs.)

5. Number of target guns: 3 pcs

6. Cooling method of target gun: water cooling

7. Size of target material: Ø2″, thickness 0.1-5mm (different thicknesses due to different target materials)

8. DC sputtering power: 500W (optional)

9. RF sputtering power: 300W/500W (optional)

10. Sample stage: Ø140mm, optional bias voltage function can be installed according to customer requirements to achieve higher quality of coating.

11. Speed of sample stage: adjustable within 1rpm to 20rpm

12. Working gas: Ar , N2 and other inert gases

13. Intake air path: Mass flow meter controls 2 air-intake paths, one is 100SCCM and the other is 200SCCM.

Product Dimension and Weight

main machine dimension: 500mm×560mm×660mm

Overall dimension: 1300mm×660mm×1200mm

Weight: 160kg

Magnetron Plasma Sputtering Coater

Standard Accessories

1. DC Power Control System: 2 set

2. RF Power Control System: 1 set

3. Film Thickness Monitor System: 1 set

4. Molecular Pump (imported from Germany): 1 pcs

5. Water Cooler: 1 pcs

6. Polyester PU pipe (Ø6mm): 4m

Optional Accessories

1. Various target materials such as gold, indium, silver, platinum, etc.

2. Mask

3. Vibrating Sample Stage



Warranty

    One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)



Logistics

compact Plasma sputtering coater


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