• Single Head High Vacuum Magnetron Plasma Sputtering Coater

    Single Head High Vacuum Magnetron Plasma Sputtering Coater

    VTC-600-1HD Single-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-1HD single-head magnetron sputtering coater is equipped with one target gun, choosing a strong magnetic target or a weak magnetic target.

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  • Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

    Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

    VTC-600-2HD Dual-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-2HD dual-head magnetron sputtering coater is equipped with two target guns and two power supplies, one RF power supply for sputter coating of non-conductive materials, and one DC power supply for sputter coating of conductive materials.

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  • Plasma Sputtering Coater With 3 Sputtering Sources

    Plasma Sputtering Coater With 3 Sputtering Sources

    VTC-600-3HD Threel-Head Magnetron Sputtering Coater is a coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-3HD three-head magnetron sputtering coater is equipped with three target guns, one RF power supply for sputter coating of non-conductive materials, and two DC power supplies for sputter coating of conductive materials.

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  • Plasma Sputtering Coater With 3 Sputtering Sources And Glove Box

    Plasma Sputtering Coater With 3 Sputtering Sources And Glove Box

    VGB-600-3HD Thin-Film Battery Preparation System can perform experimental operations in a glove box, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. The system is equipped with three target guns and one RF power supply for sputter coating of various target materials. The RF power supply can be connected to any target head by a transfer switch.

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