• Single Head High Vacuum Magnetron Plasma Sputtering Coater

    Single Head High Vacuum Magnetron Plasma Sputtering Coater

    VTC-600-1HD Single-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-1HD single-head magnetron sputtering coater is equipped with one target gun, choosing a strong magnetic target or a weak magnetic target.

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  • Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

    Dual-Head High Vacuum Magnetron Plasma Sputtering Coater

    VTC-600-2HD Dual-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-2HD dual-head magnetron sputtering coater is equipped with two target guns and two power supplies, one RF power supply for sputter coating of non-conductive materials, and one DC power supply for sputter coating of conductive materials.

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  • Plasma Sputtering Coater With 3 Sputtering Sources

    Plasma Sputtering Coater With 3 Sputtering Sources

    VTC-600-3HD Threel-Head Magnetron Sputtering Coater is a coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc. VTC-600-3HD three-head magnetron sputtering coater is equipped with three target guns, one RF power supply for sputter coating of non-conductive materials, and two DC power supplies for sputter coating of conductive materials.

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