• Compact Tape Casting Film Coater With Vacuum Chuck 300mm×150mm

    Compact Tape Casting Film Coater With Vacuum Chuck 300mm×150mm

    MSK-AFA-I Automatic Coater is widely used in various high-temperature coating research, such as ceramic films, crystal films, battery material films, special nano films, and can adapt to future development of film-forming technology under high temperature conditions. The substrate is fixed by means of vacuum adsorption, so that there is no wrinkle phenomenon on the substrate during the coating process, and the coating is even smoother. The width of the film remain unchanged, and the film thickness can be adjusted according to the micrometer above the doctor blade.

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  • Compact Tape Casting Film Coater With Vacuum Chuck 600mm×250mm

    Compact Tape Casting Film Coater With Vacuum Chuck 600mm×250mm

    MSK-AFA-II-VC Automatic Coater is widely used in various high-temperature coating research, such as ceramic films, crystal films, battery material films, special nano films. The substrate is fixed by means of vacuum adsorption, so that there is no wrinkle phenomenon on the substrate during the coating process, and the coating is even smoother.The width of the film remain unchanged, and the film thickness can be adjusted according to the micrometer above the doctor blade.

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  • Compact Tape Casting Film Coater With Top Heating Cover

    Compact Tape Casting Film Coater With Top Heating Cover

    MSK-AFA-III compact casting coater with automatic drying function achieves smooth and uniform coating effect by advancing/propelling/pushing the precision film applicator at a constant speed. After coating, the upper cover can heat and dry the film, and the temperature control accuracy is ±1°C.

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  • Compact Tape Casting Film Coater With Heatable Vacuum Bed

    Compact Tape Casting Film Coater With Heatable Vacuum Bed

    MSK-AFA-IIID Compact Casting Coater with automatic drying function adopts bottom heating and is designed and developed by our company.The equipment adopts the bottom vacuum to absorb the samples, and has bottom heating function. The heating temperature can reach up to 120℃, and the function of film baking is realized during the coating process, so that the film can be dried quickly.

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  • Compact Tape Casting Film Coater With Top UV Cover

    Compact Tape Casting Film Coater With Top UV Cover

    MSK-AFA-IIID-UV UV Casting Coater with automatic drying function adopts bottom heating and is designed and developed by our company. The upper cover adopts UV light source and is especially suitable for materials sensitive to UV light, which can quickly solidify the coated film. In addition, the UV lamp also has a polymerization function, which can polymerize the monomer into a polymer film.

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  • 120ºC Max. Film Coater With Heatable Vacuum Bed

    120ºC Max. Film Coater With Heatable Vacuum Bed

    MSK-AFA-IID Compact Casting Coater with automatic drying function is mainly used for coating liquid or colloidal film in laboratory. The equipment adopts the bottom vacuum to absorb the samples, and has bottom heating function. The heating temperature can reach up to 120℃, and the function of film baking is realized during the coating process, so that the film can be dried quickly.

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  • Large Tape Casting Flim Coater With Heatable Vacuum Bed

    Large Tape Casting Flim Coater With Heatable Vacuum Bed

    MSK-AFA-L1000 Compact Coater with automatic drying function is mainly used for coating liquid or colloidal film in laboratory. The equipment adopts the bottom vacuum to absorb the samples, and has bottom heating function. The heating temperature can reach up to 120℃, and the function of film baking is realized during the coating process, so that the film can be dried quickly.

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  • High Vacuum Plasma-enhanced Chemical Vapor Deposition System (PECVD)

    High Vacuum Plasma-enhanced Chemical Vapor Deposition System (PECVD)

    Parallel-plate Capacitive PECVD is a technology that uses plasma to activate reactive gases to promote chemical reactions on the substrate surface or near-surface space to form solid-state films. The basic principle of plasma chemical vapor deposition technology is that under the action of high frequency or DC electric field, the source gas is ionized to form plasma, and the low temperature plasma is used as the energy source, an appropriate amount of reactive gas is introduced, and the plasma discharge is used to activate the reactive gas and forms chemical vapor deposition.

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  • Large Tape Casting Flim Coater With Coating Area 1100mm×550mm

    Large Tape Casting Flim Coater With Coating Area 1100mm×550mm

    MSK-AFA-L1100 Automatic Coater is widely used in various high-temperature coating research, such as ceramic films, crystal films, battery material films, special nano films. The length of the film can be controlled according to the travel distance of the doctor blade, whose limit is up to 1025mm. Related drying equipment can be added to this machine according to customer requirements to meet more needs for coating.

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