• Desktop Vacuumless Spin Coater

    Desktop Vacuumless Spin Coater

    VTC-50A Spin Coater adopts independent power supply systems for motor part and control part, and the speed control system adopts single-chip microcomputer with high anti-interference to control, so that the rotation speed is very high and stable in the range of 1000-8000RPM. The coater has two stages during operation, namely T1 stage at low speed time and T2 stage at high speed time.

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  • Spin Coater (8K rpm, 4

    Spin Coater (8K rpm, 4" Wafer Max.) With 3 Vacuum Chuck

    VTC-100 Vacuum Spin Coater is equipped with 3 vacuum chucks (for standard) of different sizes, and different vacuum chucks can be selected according to the size of samples. During working, VTC-100 vacuum spin coater uses vacuum plate adsorption method to fix the sample onto the sample plate. The equipment uses two-stage program to control the speed.

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  • Compact Spin Coater (8K rpm, 4

    Compact Spin Coater (8K rpm, 4" Wafer Max.) Low Chuck Deisgn

    VTC-100B Vacuum Spin Coater is an upgraded version of VTC-100 vacuum spin coater. The upper cover folded for opening and closing, and is equipped with a safety lock. At the same time, it has the function of open-cover protection to better guarantee the safety of the operator.

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  • Programmable Vacuum Chuck Spin Coater (500-6000 rpm, 8

    Programmable Vacuum Chuck Spin Coater (500-6000 rpm, 8" Max)

    VTC-200 Vacuum Spin Coater has the advantages of simple operation, convenient cleaning and small size. It is mainly used in the film growing process in laboratories of colleges and universities and scientific research institutes. During working, VTC-200 vacuum spin coater uses vacuum plate adsorption method to fix the sample onto the sample plate. The equipment uses two-stage program to control the speed.

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  • Hi-Speed Spin Coater (10K rpm & 5

    Hi-Speed Spin Coater (10K rpm & 5" Max)

    VTC-100PA Vacuum Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. It can be used for strong acid and strong alkali coating solution. The equipment is equipped with two vacuum chucks of different sizes (for standard) selected according to the size of the sample. The equipment can store 12 sets of programs, and each set contains 6 running stages.

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  • Hi-Speed Spin Coater With 100ºC Heating Cover

    Hi-Speed Spin Coater With 100ºC Heating Cover

    VTC-100PA-I Vacuum Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. It can be used for strong acid and strong alkali coating solution. The equipment is equipped with two vacuum chucks of different sizes (for standard) selected according to the size of the sample. The equipment can store 12 sets of programs, and each set contains 6 running stages.

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  • Hi-Speed Spin Coater With 200ºC Heating Cover

    Hi-Speed Spin Coater With 200ºC Heating Cover

    VTC-100PA-II Vacuum Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. It can be used for strong acid and strong alkali coating solution. The equipment is equipped with two vacuum chucks of different sizes (for standard) selected according to the size of the sample. The equipment can store 12 sets of programs, and each set contains 6 running stages.

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  • Hi-Speed Spin Coater (10K rpm & 5

    Hi-Speed Spin Coater (10K rpm & 5" Max) With UV Cover

    VTC-100PA-UV UV Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. The upper cover adopts UV light source and is especially suitable for materials sensitive to UV light, which can quickly solidify the coated film. In addition, the UV lamp also has a polymerization function, which can polymerize the monomer into a polymer film.

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  • Anti-Corrosion Spin Coater (6K RPM & 6

    Anti-Corrosion Spin Coater (6K RPM & 6" Wafer Max.)

    VTC-200P Vacuum Spin Coater is suitable for semiconductor process, crystal, optical disc, plate making and surface coating, etc. The equipment can store 12 sets of programs, and each set contains 6 running stages. The upper cover of the chamber can heat the sample (optional function), which is beneficial to the coating process of thin film materials with high viscosity.

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