Continuous Multi-chamber Magnetron Sputtering Coating System
1. Our newly launched VTC-600GC-AM magnetron sputtering coating system is driven by a frequency-modulated motor, offering a high degree of automation.
2. The magnetron sputtering coating system, meticulously designed and controlled by our technical department, greatly improves the stability of equipment operation and significantly enhances the user experience.
3. The magnetron sputtering coating system boasts a wider range of applications compared to similar products, and its compact size facilitates storage.
- Shenyang Kejing
- Shenyang, China
- 10 working days
- 50 sets
- Information
Introduction of the magnetron sputtering coating system:
The VTC-600GC-AM sputtering coating machine is a newly developed high-performance thin film preparation equipment, consisting of a transfer chamber and a sputtering coating chamber. The substrate holder reciprocates between the two chambers, driven by a frequency-modulated motor, achieving automatic synchronous operation; the reciprocating stroke position and operating speed can be precisely set. Both chambers of the sputtering coating machine are equipped with positioning calibration functions, supporting rapid origin reset to ensure the stability and repeatability of the process.
The sputtering coating machine is suitable for the preparation of various types of thin films, including: ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films, dielectric thin films, optical thin films, oxide thin films, hard thin films, PTFE thin films, etc. The sputtering coating machine can be equipped with a multi-target structure, and can be paired with an RF power supply (for non-conductive targets) and a DC power supply (for conductive targets) to meet the sputtering coating needs of different material systems, making it widely applicable.
Compared to traditional equipment, the VTC-600GC-AM sputtering coating machine not only boasts a wide range of applications and strong functional expandability, but also features a compact structure, convenient operation, and small footprint. It is an ideal system for laboratory preparation of high-quality thin film materials, particularly suitable for cutting-edge research fields such as solid-state electrolytes, OLEDs, and organic/inorganic optoelectronic materials.
The VTC-600GC-AM provides researchers with a professional and efficient thin film preparation solution through its stable and reliable performance, high uniformity sputtering effect, and flexible expansion capabilities.
Key features of the magnetron sputtering coating machine:
• Dual-chamber structure: The magnetron sputtering coating machine consists of a transfer chamber and a sputtering chamber, enabling rapid sample transfer and continuous coating, significantly improving film preparation efficiency.
• Flexible multi-target configuration: The magnetron sputtering coating machine can be equipped with multiple target guns, supports both RF and DC power supplies, and is suitable for conductive and non-conductive targets. Target guns can be freely interchanged according to process requirements.
• Wide range of applications: The magnetron sputtering coating machine can prepare various types of thin films, including metals, oxides, ceramics, dielectrics, and optical films, meeting the research needs of multiple fields.
• Compact size and simple operation: The magnetron sputtering coating machine has a small footprint and a reasonable layout, making it convenient for laboratory use.
• Modular design: The transfer chamber, vacuum chamber, pump set, and power supply can all be configured independently, facilitating expansion and maintenance.
• Optional power supply configuration: The magnetron sputtering coating machine supports single power supply control of multiple target guns, or independent control of multiple power supplies, meeting the requirements of different film preparation processes.
Technical parameters of the magnetron sputtering coating machine:
| Product Name | VTC-600GC-AM Continuous Multi-Chamber Magnetron Sputtering Coating System |
| Product Model | VTC-600GC-AM |
| Main Parameters | 1. Equipment Structure: Tabletop front-opening design, rear-mounted vacuum system layout. 2. Ultimate Vacuum: 6.0 × 10⁻⁵ Pa. 3. Leakage rate: ≤ 0.5 Pa / 1 h. 4. Pumping efficiency: Approximately 5 minutes to pump from atmospheric pressure to 5.0 × 10⁻³ Pa. 5. Vacuum pump assembly: Mechanical pump + molecular pump combination. 6. Sample stage parameters: · Dimensions: φ140 mm; · Temperature range: Room temperature ~ 500 ℃ (can be increased upon request); · Temperature control accuracy: ±1 ℃; · Rotation speed: Adjustable 5–20 rpm; · Optional bias module to improve film quality. 7. Inlet system: Dual-channel mass flow meter (Ar / N₂). 8. Target installation angle: 34° angle between the target and the sample stage central axis. 9. Number of targets: Standard configuration: 3 targets, 120° apart (more targets can be customized). 10. Target cooling method: Water cooling. 11. Target material dimensions: φ2″, thickness 0.1–5 mm (thickness varies depending on the type of target material). |
| Compliance | CE Certified, UL or CSA certification is available at extra cost. |
Key Operating Points of magnetron sputtering coating system:
1. Substrate Surface Treatment: Before coating, the substrate needs appropriate surface treatment to ensure uniform adhesion and good durability. Surface treatment methods can include cleaning, decontamination, polishing, and etching.
2. Coating Selection: When selecting a coating, its physicochemical properties, solubility, viscosity, and solids content must be considered, and a suitable coating should be selected based on the material requirements.
3. Coating Thickness Control: Coating thickness is one of the important factors affecting coating performance. The coating thickness needs to be controlled during the coating process, typically by controlling the wire rod or doctor blade scraping speed, the film thickness of the coating machine, and the coating viscosity.
4. Coating Uniformity Control: Coating uniformity also has a significant impact on coating performance. During the coating process, it is necessary to maintain a uniform distribution of the coating and ensure that the coating surface is free of obvious defects and bubbles.
5. Coating Machine Parameter Settings: The parameter settings of the coating machine are also crucial. The temperature, speed, vacuum level, and other parameters of the coating machine need to be set appropriately according to different coatings and substrate types to ensure the quality and performance of the coating.
6. Safe Operation: Safety precautions must be taken when operating the coating machine, especially since some materials are toxic. Wearing protective glasses, gloves, and respirators is recommended to avoid harm to personnel and the environment.
About Our Services:
We have focused on the research and design of laboratory equipment for many years, possessing superior technology and rich experience. Regarding flatbed coating machines, we have years of R&D experience, and our equipment has significant advantages in precision, stability, and efficiency.
