Chemical Mechanical Polishing Machine
Brand Shenyang Kejing
Product origin Shenyang, China
Delivery time 22 working days
Supply capacity 50 sets
UNIPOL-1203 Chemical Mechanical Grinding and Polishing Machine is suitable for CMP flattening and smoothing technology. The grinding part of the whole machine is made of anti-corrosion material, resistant to chemical corrosion, and is equipped with automatic slurry feeder and precision lapping controller, automatic touch screen panel. It can meet the needs of processing different surfaces such as wafers in terms of both processing performance and speed at the same time.
Main Features
1. Ultra-flat stainless steel polishing plate (flatness is less than 0.0025mm per 25mm×25mm)
2. Ultra-precision rotating spindle (the pallet end jump is less than 0.01mm)
3. Equipped with two processing work stations, which can be controlled separately
4. Equipped with a fully automatic control touch screen panel, which can set the spindle speed, swing arm speed and lapping time
5. Equipped with an automatic slurry feeder, visual adjustment of flow rate, automatic grinding and polishing
6. Equipped with GPC-100A precision lapping controller, which can adjust the pressure and trim the surface shape, making grinding and polishing more convenient and fast
7. The grinding part is made of anti-corrosion material, resistant to chemical corrosion.
Technical Parameters
Product Name | UNIPOL-1203 Chemical Mechanical Grinding and polishing Machine / Lapping Machine |
Product Model | UNIPOL-1203 |
Installation Conditions | This equipment is required to be used at an altitude of 1000m or less, a temperature of 25℃±15℃, and a humidity of 55%Rh±10%Rh. 1. Water: The equipment is equipped with water inlet and water outlet, and needs to be connected to the tap water and drainage by users. 2. Electricity: AC220V 50Hz, must have good grounding 3. gas: N/A 4. Workbench: size 800mm×600mm×700mm, bearing more than 200kg 5. Ventilation device: no need |
Main Parameters (Specification) | Main part of the machine |
1. Power supply: 220V 2. Power: 450W 3. lapping plate speed: 10-240rpm 4. lapping work stations: 2 5. Swing arm adjustment gear: 1-15 gears 6. pallet end jump: 0.008/250mm 7. Stainless steel lapping plate: φ300mm 8. Sample holding plate: φ105mm 9. Condition ring: φ127.5mm | |
GPC-100A precision lapping controller | |
1. Diameter of sample plate: Ø103mm 2. Axial travel distance of sample plate: 12mm 3. Digital display accuracy: 0.001mm 4. Adjustable loading pressure of sample plate: 0.1kg-2.1kg 5. Valid range of pressure confirmation instrument: 1g-5000g 6. Sample installation method: vacuum adsorption 7. Size of sample: diameter ≤103mm, thickness ≤12mm 8. Size: outer diameter 146mm, height 266mm | |
Automatic slurry feeder | |
SKZD-2 roller slurry feeder 1. Volume: 1.5L 2. Flow rate: 0-35ml/min 3. Size: 170×290×350mm Weight: 3kg SKZD-4 automatic slurry feeder 1. liquid feeding pump: 4 2. slurry bottle: 600ml/bottle 3. Timing range: 1-999min 4. Flow: 0.1ml/min-10ml/min 5. Size: 230×370×450mm Weight: 10kg | |
Product Dimension and Weight | 1. Dimension: 550mm×700mm×420mm 2. Weight: 74kg |
Standard Accessories
No. | name | qty | picture |
1 | Cast Iron Grinding Plate (Ф300mm) | 1 pcs |
|
2 | Stainless Steel Grinding Plate (Ф300mm) | 1 pcs |
|
3 | Sample Holding Plate (ceramic) | 1 pcs |
|
4 | Condition Ring (ceramic) | 1 pcs |
|
5 | Polishing Pad (Nubuck Leather, Synthetic Leather, Polyurethane) | 1 pcs each |
|
6 | Magnetic Sheet (with adhesive on the back) | 2 pcs | |
7 | (Steel) Lapping Buffer Sheet | 2 pcs | |
8 | Corundum Grinding Powder | 0.5kg |
|
9 | Wax Bar | 4 pcs |
|
10 | Silica Suspension Polishing Fluid 2040 W0.05 | 1 bottle |
Optional Accessories
No. | name | functional type | picture |
1 | YZXZ-12 Stirring Circulation Pump | (optional) |
|
2 | Precision Thickness Gauge | (optional) |
|
3 | Ceramic Lapping Plate | (optional) |
|
4 | Glass Lapping Plate | (optional) |
|
5 | Magnetic Resin Diamond Polishing Sheet | (optional) |
Warranty
· One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)
Logistics