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Single Head High Vacuum Magnetron Plasma Sputtering Coater

VTC-600-1HD Single-Head Magnetron Sputtering Coater is a high vacuum coating equipment newly developed by our company, and is used to prepare single-layer or multi-layer ferroelectric film, conductive film, alloy film, semiconductor film, ceramic films, dielectric film, optical film, oxide film, hard film, PTFE film, etc.
VTC-600-1HD single-head magnetron sputtering coater is equipped with one target gun, choosing a strong magnetic target or a weak magnetic target.

  • Shenyang Kejing
  • Shenyang, China
  • 22 working days
  • 50 sets
  • Information

Product Introduction

The VTC-600-1HD Single-Target Magnetron Sputtering System is a newly developed high-vacuum coating instrument designed and manufactured by our company. It is specifically engineered for research institutions and laboratories to prepare a wide range of thin films. The system is suitable for fabricating single-layer or multilayer films such as ferroelectric films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard coatings, and PTFE films.

The VTC-600-1HD is equipped with one magnetron sputtering gun, which can be configured with either a strong magnetic target or a weak magnetic target depending on the application:

  • · The weak magnetic target is suitable for sputtering non-magnetic materials.

  • · The strong magnetic target is designed for efficient sputtering of ferromagnetic materials.

Featuring a high-vacuum chamber and a stable power control system, the VTC-600-1HD ensures excellent film uniformity and adhesion. Compared with similar equipment, it offers a compact design, easy operation, and broad material compatibility, making it an ideal choice for laboratory thin-film deposition and advanced materials research.


Main Features

1. It is equipped with one target gun, choosing one RF power supply for sputter coating of non-conductive materials or one DC power supply is used for sputter coating of conductive materials.

2. A variety of thin films can be prepared with a wide range of applications.

3. Small size and easy to operate


Technical Parameters

Product Name

VTC-600-1HD Single-Head Magnetron Sputtering Coater

Product Model

VTC-600-1HD

Installation Conditions

This equipment is required to be used at an altitude of 1000m or less, a temperature of 25℃±15℃, and a humidity of 55%Rh±10%Rh.

1. Water: The equipment is equipped with a self-circulating water cooler (filling with pure water or deionized water)

2. Electricity: AC220V 50Hz, must have good grounding

3. gas: The equipment chamber needs to be filled with argon gas (purity 99.99% or more), and argon gas cylinders (with Ø6mm double ferrule joints) and pressure reducing valve need to be provided by users.

4. Workbench: size 1500mm×600mm×700mm, bearing more than 200kg

5. Ventilation device: needed

Major Parameters

(Specification)

1. Power supply voltage: 220V 50Hz

2. Power: <1KW (not including vacuum pump)

3. Inner diameter of Chamber: Ø300mm

4. Limit of vacuum degree: 9.0×10-4Pa

5. Heating temperature of sample stage: RT-500℃, accuracy ±1℃ (Temperature can be increased according to actual needs.)

6. Number of target guns: 1 pcs (other quantities for option)

7. Cooling method of target gun: water cooling

8. Size of target material: Ø2″, thickness 0.1-5mm (different thicknesses due to different target materials)

9. DC sputtering power: 500W; RF sputtering power: 300W (The type of target power supply is optional: one DC power supply or one RF power supply.)

10. Sample stage: Ø140mm, optional bias voltage function can be installed according to customer requirements to achieve higher quality of coating.

11. Speed of sample stage: adjustable within 1rpm-20rpm

12. Working gas: Ar and other inert gases

13. Intake air path: Mass flow meter controls 2 air-intake paths, one is 100SCCM and the other is 200SCCM.

Product Dimension and Weight

1. main machine dimension: 500mm×560mm×660mm

2. Overall dimension: 1300mm×660mm×1200mm

3. Weight: 160kg

4. Vacuum chamber dimension: φ300×300mm


Standard Accessories

No.NameQuantityImage
1DC power control system (optional)1 set-
2RF power control system (optional)1 set-
3Water cooler1 pc-
4Polyester PU pipe (Ø6mm)4m-


Optional Accessories

No.NameFunction CategoryImage
1Various target materials such as gold, indium, silver, platinum, etc.optional-
2Optional strong magnetic target for sputtering ferromagnetic materialsoptional-
3Film thickness monitor systemoptional-
4molecular pump (imported from Germany)optional-


Warranty    

One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)



Logistics

Plasma Sputtering Coater


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