Plasma Thin Film Sputtering Instrument
1. Thin Films Sputtering Machine is specially designed for the preparation of metal coatings such as gold, platinum, indium, silver, etc., and has strong adaptability.
2. Thin Films Sputtering Machine is independently built by our company, using highly durable materials and can be used for a long time.
3. Thin Films Sputtering Machine is equipped with an operation panel, which can set the working time and current size, and facilitate the control of the experimental process.
- Shenyang Kejing
- Shenyang, China
- 10 working days
- 50 sets
- Information
Introduction of Desktop magnetron plasma sputtering coater machine:
GSL-1100X-SPC-12 Desktop magnetron plasma sputtering coater machine is specially designed for coating metal films (such as gold, platinum, indium, silver, etc.) on substrates. The maximum sample size diameter is 40mm, and the film thickness can reach 300Å. It is particularly suitable for gold plating SEM samples as a conductive electrode.
Features of Desktop magnetron plasma sputtering coater machine:
1. The product can adjust the current and set the sputtering time.
2. The product has passed CE certification and complies with international standards.
Technical parameters of the Thin Films Sputtering Machine:
| Product model | GSL-1100X-SPC-12 plasma thin film sputtering instrument |
| Installation conditions | This equipment is required to be used at a temperature of 25℃±15℃ and a humidity of 55%Rh±10%Rh. 1. Water: Not required. 2. Electricity: AC220V 50Hz, must be well grounded. 3. Gas: The equipment chamber needs to be filled with argon (purity above 99.99%) for cleaning, and you need to bring your own argon gas cylinder. 4. Workbench: size 600mm×600mm×700mm, load-bearing capacity above 50kg. 5. Ventilation device: required. |
| Technical parameters of Mini Plasma Sputtering Coater | 1. Input power of Mini Plasma Sputtering Coater: 208V-240V 50Hz/60Hz. 2. Sample stage: Ø60mm, height adjustable. 3. Quartz cavity: Ø100mm×130mm. 4. Air inlet: There is a valve inside, which can be used to introduce various gases into the cavity. 5. Target: Gold target with a purity of 4N, Ø57mm×0.12mm.
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Specifications of Mini Plasma Sputtering Coater | Size: 480mm×320mm×150mm; Weight: 20kg |
| Optional accessories of Mini Plasma Sputtering Coater | 1. Au (Ø57mm×0.12mm, 4N) 2. Pt (Ø57mm×0.12mm, 4N) 3. Ag (Ø57mm×0.5mm, 4N) |
About our advantages:
1. Independent R&D and manufacturing capabilities:
Shenyang Kejing has independent R&D and production capabilities. All technologies are developed internally by the company to ensure product quality and technological leadership.
2. Efficient customer service:
The company focuses on customer needs, provides customized solutions, and can quickly respond to customers' technical support needs to improve customer experience and satisfaction.
3. Strong industry experience:
Shenyang Kejing has accumulated rich experience in multiple industry fields, especially in high-precision equipment and technological innovation, helping customers improve production efficiency and technical level.
