Plasma Cleaner With Vacuum Pump
The plasma chamber of PCE-6 small plasma cleaner is a quartz chamber of Ø160mm×190mm. The RF power used is 3.0MHz (1%), and the output power is adjustable in three levels: 7.2W, 10.2W, and 29.6W. This machine mainly removes the oxide layer and contaminants on the substrates through plasma of air, oxygen or argon and other gases, and can also change the properties of the surface of objects (such as hydrophilicity and hydrophobicity, etc.).
- Shenyang Kejing
- Shenyang, China
- 10 working days
- 50 sets
- Information
Product Introduction
The PCE-6 Compact Plasma Cleaner features a quartz plasma chamber measuring Ø160 mm × 190 mm and is equipped with an RF power supply operating at 3.0 MHz (±1%), with three adjustable output power levels: 7.2 W, 10.2 W, and 29.6 W.
This system uses plasma generated from gases such as air, oxygen, or argon to remove oxides and contaminants from substrates, while also modifying surface properties (e.g., hydrophilic or hydrophobic characteristics). It is ideal for substrate cleaning and thin-film treatment.
The PCE-6 is compact and space-saving, making it suitable for laboratory environments. It is equipped with a dual-rotary vacuum pump for evacuating the chamber while allowing the introduction of gases like argon, making it especially suitable for cleaning easily oxidized materials.
Main Features
1. Through the buttons and switches of the control panel, the RF power, the opening and closing of the vacuum pump, and the cleaning time can be controlled and adjusted.
2. Time, power, vacuum degree and other information are displayed on a group of 4 digital tubes.
3. Equipped with a three-way valve, which can precisely control the intake air flow and clean the chamber with atmospheric air. The intake interface is a 6mm card sleeve interface.
4. A large-power RF power supply equipment is chosen to perform plasma etching and ashing experiments.
Technical Parameters
Product Name | PCE-6 Small Plasma Cleaner |
Product Model | PCE-6 |
Main Parameters (Specification) | 1. Power supply: AC220V 50/60Hz 2. Output power: 7.2W, 10.2W, 29.6W 3. Vacuum pump power: <500W 4. Total power: <600W 5. RF frequency: 3.0MHz, power can be adjusted manually in 3 levels 6. Plasma chamber: high-purity quartz chamber of Ø160mm×190mm, sealed with aluminum folded flange with an observation window of Ø45mm on the flange 7. Vacuum pump: 120L/min, direct-connected double-stage rotary vacuum pump 8. Ultimate vacuum: 50mtorr 9. Gas introduction: Various gases can be introduced to generate plasma, such as N2, Ar, H2, O2, Air and mixed gases (selected according to material properties) for cleaning and etching |
Product Dimension and Weight | Dimension: 400mm×300mm×300mm Weight: 10.2kg |
Optional Accessories
| No. | Name | Function Category | Image |
| 1 | 2"-6" Quartz Boat/Carrier (for holding substrate) | Optional | - |
| 2 | 2-4 Channel Proton or Float Gas Mixing System | Optional | - |
Warranty
One year limited with lifetime support (not including rusted parts due to inadequate storage conditions)
Logistics
